In plasma-based semiconductor processes, the durability and precision of materials are directly linked to productivity.

Silicon Carbide (SiC), known for its high thermal conductivity, excellent plasma resistance, and low particle generation, has become a leading material for high-temperature processes such as etching (Etch) and chemical vapor deposition (CVD).

Ronda Korea designs and supplies a variety of SiC-based components—including Upper Electrodes, Focus Rings, and Liners—customized to each customer’s process requirements. These products have been highly praised by customers for their durability and consistency in actual process environments.

Through its high-performance SiC product lineup, Ronda Korea continues to focus its capabilities on increasing market share among global equipment customers and enhancing profitability by concentrating on high value-added products that contribute directly to process efficiency and yield improvement.