Precision technology that leads the global semiconductor market
Facility Solution
APC Valve
Precisely controls process chamber pressure in real time
Feedback-based automatic control improves process accuracy
High-speed response enables fine vacuum stage transitions
Gate Valve
Mechanically isolates vacuum zones inside and outside the chamber
Durable materials ensure long life for repeated operations
Designed to minimize leakage in high vacuum conditions
Slit Valve
Maintains vacuum and enables automatic opening/closing during wafer loading
Particle-suppressing structure ideal for high-cleanliness process lines
Corrosion-resistant coating compatible with various process gases