Precision technology that leads the global semiconductor market
Consumable Parts
Ring
Maintains heat resistance and insulation during high-temperature and plasma processes
Transparent characteristics enable optical monitoring during processing
Anti-static function minimizes particle generation
Showerhead
Excellent gas diffusion uniformity and chemical stability due to quartz properties
Non-metallic electrode prevents ion contamination in specific processes
Enables fine gas control in CVD and Dry Etch processes
Boat
Maintains precise wafer alignment during high-temperature thermal processes
Optimized heat-resistant glass properties for oxidation and diffusion processes
Maintains shape and suppresses particle generation even under prolonged high temperatures
Tube
Ensures a stable processing environment inside thermal and gas reaction furnaces
Neutral to gas reactions, minimizing process contamination
Low thermal expansion rate supports process repeatability